[全省]【免費國際研討會】電漿蝕刻與沈積
【免費國際研討會】電漿蝕刻與沈積(Plasma Etching and Deposition)
國際研討會~7/1清華大學開講
活動介紹:
Help engineers and scientists better understand fundamentals an
d advances in Etch & Deposition processing
(幫助工程師及科學研究人員更加瞭解蝕刻與沈積製程的原理與進展)
適合對象:
Graduate students, post docs, professors, engineers, and staff
have all found the material valuable in their research and
development. The event is open to the local academic and technical
communities and staff from start-ups to industry leaders participates.
Often over 125 participants attend from multiple organizations and
we have been honored to have some travel several hours to the workshop.
(此研討會開放給學校、技術研究單位或是當加入產業的員工,適合之對象為研
究生、博士後研究員、教授、工程師......。一般而言,會有超過125位參加人
員來自不同的組織或單位)
議程:
08:30-09:00 Registration
09:00-10:45 Talk1. Basics: Plasma and Reactors
10:45-11:00 Coffee Break
11:00-12:00 Talk2. Plasma Etching Mechanisms
12:00-13:00 Luncheon
13:00-15:00 Talk3. Dielectric Etching
Compound Semiconductor Etching
15:00-15:15 Coffee Break
15:15-17:00 Talk4. Deep Silicon Etching
PECVD and HDP CVD (high density plasma CVD)
演講者介紹:
David Lishan, Ph.D.
Principal Scientist
Plasma-Therm, LLC
專長:
Plasma processing for R&D, MEMS, photonics, data storage,
power, and compound semiconductor applications
舉辦日期:2014/07/01(週二)09:00-17:00,共7小時
舉辦地點:國立清華大學(新竹市光復路二段101號) 動力機械工程學系
工程一館 108室
課程費用:全程免費
課程網站:http://edu.tcfst.org.tw/edm/03A363.asp
客服專線:03-5735521#3227 呂小姐 yllu@tcfst.org.tw
主辦單位:Plasma-Therm LLC and Scientech Corporation
歡迎自行轉載
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